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   U.S. Proto Flex Company PECVD (plasma enhanced chemical vapor deposition) system is capable of depositing high-quality SiN, SiO, SiO2 films, Si3N4 films, amorphous silicon, silicon carbide, solar energy materials, diamond, diamond-like films, rigid films, optical films variety of thin film materials and carbon nanotubes (CNT) and so on. Optional radio frequency (RF), high-density hollow cathode plasma (HCD) source, an inductively coupled plasma (ICP) source. The company uses advanced technology and reliable design to provide you with multi-faceted services.

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